* P]
SҶƄzt
Ϣ
zt Photomask substrates
Ԕf
ztһNӲģϣĤǮǰδӹĤйϣஔõĸйzƽ߹❍ȵIJͨ^ֱſ؞R䣨SPeϵt-tĤγtĤͿһӹ¿gַQzgƳɄztztĤĻģ
ԣztиߵĸй`ȡ߷ֱȱcܶȡĥԺ坍̎ʹÉLc
aƷVڰ댧w·оƬ·ܶ댧wԪ@ʾWИI(y)Ĥܶӡƾ·壨PCBИI(y)ȡ
|ݸк\WƷ˾Ϣ
IaƷԪӰyx,I(y)׃R^,˶,ֱʰ,Уʲy,ֳ,a,ֹRƬ,R,R,R,ƽƽ,ƽƽ,W_,ͶӰ,ZSyԇx ˾ݣ2010
˾Wַhttp://hcgxcy.glass.com.cn
^(q)V| |ݸ |ݸ
Wַ: http://hcgxcy.glass.com.cn
aƷԣ
ӋλK ؛10000000 Сӆ1 aƷr200.00 Ʒƣ Ҏ(gu)̖ bf
˾Wַhttp://hcgxcy.glass.com.cn
^(q)V| |ݸ |ݸ
Wַ: http://hcgxcy.glass.com.cn
aƷԣ
ӋλK ؛10000000 Сӆ1 aƷr200.00 Ʒƣ Ҏ(gu)̖ bf
SҶƄzt aƷśr
Wǹ늼gaI(y)ĻAҪMɲ֡e20o90ԺSWcϢƌW²ϿƌWIJںӻAϵĹWڹݔ⃦@ʾIđøͻwMɞϢǹϢgl(f)չĻAl֮һ(j)2013-2017ЇWИI(y)aNcͶYAy桷(sh)(j)@ʾSȽm(x)(wn)l(f)չЇWИI(y)l(f)չѸ(j)ҽy(tng)Ӌ֔(sh)(j)@ʾ2010WИI(y)Ҏ(gu)ģI(y)(sh)_246ңИI(y)ȫꌍF(xin)N234.05|ԪͬL53.70%;F(xin)15.37|ԪͬL87.10%;YaҎ(gu)ģ_264.50|ԪͬL77.49%ڹWИI(y)ԇN۞ΣCӰ^СИI(y)ȻF(xin)^õL^